Sans Normal Epmok 2 is a light, very wide, low contrast, italic, tall x-height font.
Keywords: headlines, branding, posters, ui display, motion graphics, futuristic, sleek, technical, aerodynamic, minimal, modernize, convey speed, tech tone, clean display, distinct silhouette, monoline, rounded, oblique, open counters, soft corners.
A monoline sans with an oblique stance and an extended, horizontally stretched footprint. Strokes are smooth and even, with rounded terminals and softly squared corners that keep shapes clean and engineered rather than calligraphic. Curves tend toward elliptical bowls (notably in O/C/G and lowercase o/e), while diagonals are sharp and decisive (V/W/X/Y), creating a crisp rhythm against the otherwise rounded construction. Counters are open and generous, and the lowercase shows a tall x-height with compact ascenders/descenders, supporting a dense, streamlined texture in running text.
Best suited to display settings where its wide, slanted silhouette can read as a deliberate stylistic choice—headlines, logos, product/tech branding, posters, and interface titles. It can work for short paragraphs or captions when ample line length and spacing are available, but it will feel more at home in larger sizes and more open layouts.
The overall tone reads modern and aerodynamic, with a subtle sci‑fi/tech sensibility. Its wide, slanted forms feel in motion, suggesting speed, precision, and contemporary digital interfaces rather than editorial tradition.
The design appears intended to deliver a clean, forward-leaning sans with a fast, contemporary voice. Its consistent monoline construction and rounded geometry prioritize clarity and a cohesive, modern texture, while the extended proportions and slant add personality for branding and display use.
Digit forms echo the same streamlined geometry, with rounded bends and simplified joins that keep numerals consistent with the letterforms. The design’s wide proportions and oblique angle make word shapes distinctive, though the slant and horizontal expansion also increase the amount of horizontal space needed for longer lines.